T-UMC05-15FS - Ø1/2" Dispersion-Compensating Mirror, 650 nm - 1050 nm, 10° AOI, Qty. 1
Product Drawing
- >99.5% Absolute Reflectance from 650 to 1050 nm
- Group Delay Dispersion (GDD) per Reflection: -1.5 mm of Fused Silica (-54 fs2 at 800 nm)
- Clear Aperture: >80% of Diameter
- 10° AOI
T-UMC05-15FS and T-UMC10-15FS chirped mirrors feature >99.5% absolute reflectance over the 650 - 1050 nm wavelength range.
The coating is engineered such that each reflection compensates for the dispersion introduced by 1.5 mm of fused silica over the entire range.
The 10° AOI allows these mirrors to perform similarly for both s- and p-polarized light, and is ideal for a compact setup where multiple reflections are needed.
The Ø1/2” mirror is 6.35 mm thick, while the Ø1” mirror is 9.5 mm thick. These mirrors can be mounted by any mirror mount that accepts these optic thicknesses.
| Specifications |
| Item # |
T-UMC05-15FS |
| Wavelength Range |
650 - 1050 nm |
| Reflectance over Wavelength Range |
Rabs > 99.5% over Wavelength Range |
| Group Delay Dispersion (GDD) per Reflection |
-54 fs2 at 800 nm |
| Size |
Ø1/2" |
| Diameter Tolerance |
+0.00 / -0.10 mm |
| Thickness |
6.35 mm (0.25") |
| Thickness Tolerance |
±0.10 mm |
| Clear Aperture |
>80% of Diameter |
| Angle of Incidence (AOI) |
10° |
| Surface Flatness |
λ/4 at 632.8 nm Over Clear Aperture |
| Surface Quality |
15-5 Scratch-Dig |
| Back Surface |
Polished |
| Laser-Induced Damage Threshold |
0.07 J/cm2 (800 nm, 43.2 fs FWHM, S-Pol, 10 000 Pulses)
|
| Substrate |
Fused Silica |
| Parallelism |
≤3 arcmin |
